The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Nov. 16, 2015
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Ching-Wei Shen, Hsinchu, TW;

Chi-Lun Lu, Hsinchu, TW;

Kuan-Wen Lin, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/86 (2012.01); G03F 1/82 (2012.01); G03F 1/22 (2012.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); B08B 7/00 (2006.01); G03F 1/72 (2012.01); G03F 1/84 (2012.01);
U.S. Cl.
CPC ...
G03F 1/86 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); B08B 7/0035 (2013.01); G03F 1/22 (2013.01); G03F 1/82 (2013.01); G03F 7/2004 (2013.01); G03F 7/32 (2013.01); G03F 1/72 (2013.01); G03F 1/84 (2013.01);
Abstract

The present disclosure provides a method of repairing a mask. The method includes inspecting a mask to identify a defect on the mask; performing a cleaning process to the mask using a non-thermal chemical solution to the mask; and repairing the mask to remove the defect from the mask. The non-thermal chemical solution is cooled by a cooling module to a working temperature below room temperature.


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