Taoyuan, Taiwan

Ching-Tang Hsueh

USPTO Granted Patents = 3 

Average Co-Inventor Count = 5.4

ph-index = 1


Location History:

  • Taipei, TW (2022)
  • Taoyuan, TW (2022 - 2023)

Company Filing History:


Years Active: 2022-2023

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3 patents (USPTO):Explore Patents

Title: Innovations by Ching-Tang Hsueh

Introduction

Ching-Tang Hsueh is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of polishing pad technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of polishing pads used in various manufacturing processes.

Latest Patents

One of his latest patents is a method for repairing polishing pads in real time. This innovative method includes a trimming step, a detection step, and a reconstruction and analysis step. The surface morphology of the polishing pad is reconstructed through detection, and analysis is performed according to the reconstruction. This ensures that the surface of the polishing pad can recover its function after trimming, allowing for effective use and cost reduction.

Another significant patent is a detection method and apparatus for polishing pads of chemical mechanical polishing devices. This invention provides a dynamic detection method and apparatus that allows for the detection of a polishing pad's surface without interrupting the manufacturing process. An isolation region is formed by the detecting device, which exposes the polishing pad for accurate detection. This timely detection enables more efficient repair and replacement of the polishing pad.

Career Highlights

Ching-Tang Hsueh is currently associated with Ta Liang Technology Co., Ltd., where he continues to innovate in the field of polishing technology. His work has been instrumental in advancing the capabilities of polishing pads, making them more efficient and cost-effective for various applications.

Collaborations

He has collaborated with notable coworkers, including Chun-Chen Chen and Hsien-Ming Lee, who contribute to the innovative environment at Ta Liang Technology Co., Ltd. Their combined expertise fosters a culture of creativity and advancement in polishing technology.

Conclusion

Ching-Tang Hsueh's contributions to polishing pad technology through his patents demonstrate his commitment to innovation and efficiency. His work not only enhances manufacturing processes but also reduces costs, showcasing the importance of continuous improvement in technology.

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