Company Filing History:
Years Active: 2001
Title: Ching-Kunn Huang: Innovator in Semiconductor Technology
Introduction
Ching-Kunn Huang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent that addresses critical challenges in the manufacturing process.
Latest Patents
Huang holds a patent for a "Method for performing a pre-amorphization implant (PAI) which provides reduced resist protect oxide damage and reduced junction leakage." This invention presents a method that minimizes damage to the resist protect oxide layer while also reducing leakage current between the gate and substrate. The patent outlines two novel approaches that utilize a photoresist mask to safeguard the RPO from implant damage during the PAI process. The first approach involves performing the PAI immediately after RPO etching to maintain the original photoresist mask on the RPO. The second approach entails re-forming the photoresist mask prior to PAI to further protect the RPO from implant damage.
Career Highlights
Ching-Kunn Huang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work has been instrumental in advancing manufacturing techniques that enhance the efficiency and reliability of semiconductor devices.
Collaborations
Huang has collaborated with esteemed colleagues, including Jiann-Jong Wang and Ding-Dar Hu, who contribute to the innovative environment at their workplace. Their collective expertise fosters a culture of creativity and technological advancement.
Conclusion
Ching-Kunn Huang's contributions to semiconductor technology through his innovative patent demonstrate his commitment to improving manufacturing processes. His work not only addresses existing challenges but also paves the way for future advancements in the industry.