Ching-Huang Shen

Title: Innovations by Ching-Huang Shen

Introduction

Ching-Huang Shen is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of polishing technology, holding two patents that showcase his innovative approach to manufacturing polishing layers and methods.

Latest Patents

Ching-Huang Shen's latest patents include a polishing layer and a polishing method. The polishing layer features a surface pattern with a cross-section that contains multiple grooves and polishing portions. Each groove is strategically placed between adjacent polishing portions. The polishing layer consists of a body layer and a surface layer, with the surface layer applied to the body layer. Notably, at least one of the polishing portions has a flattened region that exposes the body layer. The manufacturing method for this polishing layer involves creating a mold with a contour pattern, where a polymer material is cured to form a semifinished product. This product includes polishing portions corresponding to the mold's recessions and protruding portions that are later removed through a flattening process.

Career Highlights

Ching-Huang Shen is currently employed at Iv Technologies Co., Ltd., where he continues to develop innovative solutions in polishing technology. His work has contributed to advancements in manufacturing processes and product quality.

Collaborations

Ching-Huang Shen collaborates with talented coworkers, including Yu-Hao Pan and Yu-Piao Wang, who contribute to the innovative environment at Iv Technologies Co., Ltd.

Conclusion

Ching-Huang Shen's contributions to polishing technology through his patents reflect his dedication to innovation and excellence in his field. His work continues to influence the industry and inspire future advancements.