This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2018-2025.
Company Filing History:
Years Active: 2018-2025
Title: **Ching-Hua Kuan: Innovating Capacitor Technologies in Semiconductor Manufacturing**
Introduction
Ching-Hua Kuan, a renowned inventor hailing from Kaohsiung, Taiwan, has made significant contributions to the field of semiconductor manufacturing. With a total of three patents to his name, Kuan has focused on advancements in capacitor technology, particularly innovations that enhance performance through unique dielectric materials.
Latest Patents
Kuan's latest patent involves a novel method for creating a capacitor between two passivation layers with different etching rates. This method entails depositing a first passivation layer over a conductive feature, forming a capacitor on this layer, and then applying a second passivation layer with a higher dielectric constant. Notably, the method incorporates the formation of a redistribution line that connects electrically to the capacitor, along with a subsequent third passivation layer and the creation of Under-Bump-Metallurgy (UBM) for effective connectivity. This innovation aims to improve the efficiency and reliability of semiconductor devices.
Career Highlights
Ching-Hua Kuan is currently affiliated with Taiwan Semiconductor Manufacturing Company Limited, a major player in the semiconductor industry. His work there has been pivotal in developing cutting-edge technologies that drive the company's success and maintain its competitive edge in the global market.
Collaborations
Throughout his career, Kuan has worked alongside talented individuals, including Chia-Ming Huang and Ming-Da Cheng. This collaborative environment has fostered creativity and led to the successful development of innovative solutions in semiconductor technology.
Conclusion
Ching-Hua Kuan's contributions to the semiconductor industry exemplify the impact of innovative thinking and collaboration in advancing technology. His patents not only showcase a commitment to enhancing capacitor performance but also reflect the broader advancements that are essential for the future of semiconductor manufacturing.