This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2015.
Company Filing History:
Years Active: 2015
Title: Innovations by Ching-Hsin Chang
Introduction
Ching-Hsin Chang is a notable inventor based in Hemei, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for applying photoresist to semiconductor substrates.
Latest Patents
Ching-Hsin Chang holds 1 patent for his invention titled "Method of applying photoresist to a semiconductor substrate." This method involves dispensing a first solvent on a semiconductor substrate, followed by a high-viscosity polymer layer, and then a second solvent. The process concludes with spinning the substrate to spread the polymer evenly.
Career Highlights
Ching-Hsin Chang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work focuses on enhancing semiconductor manufacturing processes, which are crucial for the advancement of electronic devices.
Collaborations
Some of his coworkers include Chih-Hsien Hsu and Hu-Wei Lin, who contribute to the innovative environment at their workplace.
Conclusion
Ching-Hsin Chang's contributions to semiconductor technology exemplify the importance of innovation in the industry. His patented method showcases his expertise and commitment to advancing technology.