Location History:
- Kaohsiung, TW (2009 - 2016)
- Tainan, TW (2019 - 2021)
Company Filing History:
Years Active: 2009-2021
Title: Innovations by Ching-Chang Chen: Pioneering Dynamic Imaging Systems
Introduction
Ching-Chang Chen, an esteemed inventor based in Tainan, Taiwan, is recognized for his significant contributions to the field of imaging systems. With a total of nine patents to his name, his work is pivotal in enhancing the efficiency of digital lithography processes.
Latest Patents
Chen's recent innovations include a dynamic imaging system designed to compensate for pattern defects caused by substrate warpage. This system employs methods and apparatus that enable the creation of compensated exposure patterns. The dynamic imaging system integrates an inspection mechanism for providing 3D profile measurements and die shift measurements, facilitating the accurate exposure of photoresist with compensated pattern data.
Another notable patent focuses on multi-substrate processing within digital lithography systems. This innovation allows for the simultaneous processing of multiple substrates, enhancing productivity. The method involves leveling each substrate independently, determining offset information, and generating patterning instructions tailored for each substrate using an array of optical modules.
Career Highlights
Throughout his career, Ching-Chang Chen has worked with prominent companies such as the Industrial Technology Research Institute and Applied Materials, Inc. His expertise has played a crucial role in pushing the boundaries of imaging technology.
Collaborations
Chen has collaborated with notable individuals in the industry, including his coworkers Chien-Hua Lai and Shih-Hao Kuo. Their combined expertise has contributed to advancements in the field and the successful development of innovative technologies.
Conclusion
In summary, Ching-Chang Chen's innovative contributions, particularly in dynamic imaging systems and multi-substrate processing, demonstrate his commitment to advancing technology in the field of digital lithography. His work continues to inspire future developments and improvements in imaging solutions.
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