Chin-Yi Liu

Title: Innovator Chin-Yi Liu: Pioneering Advances in Plasma Technology

Introduction

Chin-Yi Liu, a prominent inventor based in San Jose, CA, has made significant contributions to the field of plasma processing technology. With three patents to his name, Liu's work demonstrates a commitment to advancing innovative techniques within the semiconductor manufacturing industry.

Latest Patents

Liu's latest patents showcase his expertise in optimizing plasma processing systems. One notable invention is a method for controlling the clamping of insulator-type substrates on electrostatic-type substrate support structures. This method involves applying an initial clamping voltage to rapidly accumulate electrical charge and hold the substrate in place during exposure to plasma. Liu's approach includes monitoring the leak rate of backside cooling gas and adjusting the clamping voltage accordingly to maintain optimal performance.

Another significant patent is a universal non-invasive chamber impedance measurement system and associated methods. This system is designed for measuring the impedance of a plasma processing chamber. It utilizes a radiofrequency signal generator and an impedance control module to accurately assess the actual frequency of the radiofrequency signal, allowing for improved control within plasma processing applications.

Career Highlights

Liu is currently associated with Lam Research Corporation, a leader in providing innovative wafer fab equipment and services to the global semiconductor industry. His work at Lam Research focuses on enhancing efficiency and precision in plasma processing techniques, aligning with the company's mission to drive semiconductor advancement.

Collaborations

Throughout his career, Liu has worked alongside talented colleagues including David M. Schaefer and Daniel Lai. Their collaborative efforts have contributed to the development of cutting-edge solutions in the plasma technology sector, fostering an environment of innovation and teamwork.

Conclusion

Chin-Yi Liu embodies the spirit of innovation in the semiconductor industry. With his groundbreaking patents and collaborative achievements, he continues to push the boundaries of plasma processing technology, establishing himself as a key figure in the field. His ongoing efforts promise to further enhance the functionality and efficiency of semiconductor manufacturing processes.