Company Filing History:
Years Active: 2021-2023
Title: Innovations of Chin-Wen Chen in Semiconductor Technology
Introduction
Chin-Wen Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in plasma ashing methods and photoresist removal techniques. With a total of 2 patents, his work has advanced the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Chin-Wen Chen's latest patents include a plasma ashing method using a residue gas analyzer. This innovative method analyzes the process status of various semiconductor substrate models undergoing a tested plasma ash process. The method utilizes multiple tested recipes to optimize the plasma ash process. Additionally, he has developed a photoresist removal method that also employs a residue gas analyzer. This method involves analyzing the process status of semiconductor substrate models and selecting a process recipe based on analysis results and expected performance criteria. The photoresist removal method is crucial for effectively removing photoresist layers from semiconductor substrates.
Career Highlights
Chin-Wen Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Chin-Wen Chen has worked alongside notable colleagues such as Chun-Jen Hsiao and Ya-Ping Chen. Their collaborative efforts have further enhanced the innovative processes within the semiconductor manufacturing sector.
Conclusion
Chin-Wen Chen's contributions to semiconductor technology through his patents and collaborative work have significantly impacted the industry. His innovative methods continue to pave the way for advancements in semiconductor manufacturing processes.