This inventor holds 3 USPTO granted patents. Top assignee: Industrial Technology Research Institute. Active years: 2014-2022.
Location History:
- Hsinchu, TW (2014)
- Hsinchu County, TW (2021 - 2022)
Company Filing History:
Years Active: 2014-2022
Title: Chin-Te Shih: Innovator in ESD Protection Devices
Introduction
Chin-Te Shih is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of electrostatic discharge (ESD) protection devices. With a total of 3 patents to his name, his work is recognized for its innovative approaches to manufacturing methods and materials.
Latest Patents
One of his latest patents is a manufacturing method of an ESD protection device. This method includes several steps, starting with a surface treatment performed on the substrate. Following this, a link layer is formed on the substrate, utilizing a metal material. A progressive layer is then created on the link layer, which consists of a non-stoichiometric metal oxide material. The oxygen concentration in this material is increased gradually away from the substrate in the thickness direction of the progressive layer. Finally, a composite layer is formed on the progressive layer, which includes both stoichiometric and non-stoichiometric metal oxide materials. The ratio of these materials is designed to achieve a sheet resistance value of the composite layer between 1×10Ω/sq to 1×10Ω/sq.
Another notable patent by Chin-Te Shih is the ESD protection composite structure, which comprises a link layer, a progressive layer, and a composite layer. The link layer is responsible for disposing the ESD protection composite structure on a substrate, while the progressive layer and composite layer are designed similarly to his previous patent, ensuring effective ESD protection.
Career Highlights
Chin-Te Shih is affiliated with the Industrial Technology Research Institute, where he continues to advance his research and development in ESD protection technologies. His work has been instrumental in enhancing the reliability and performance of electronic devices.
Collaborations
Chin-Te Shih has collaborated with notable colleagues, including Ming-Sheng Leu and Ding-Shiang Wang. Their combined expertise has contributed to the successful development of innovative ESD protection solutions.
Conclusion
Chin-Te Shih's contributions to the field of ESD protection devices highlight his innovative spirit and dedication to advancing technology. His patents reflect a deep understanding of materials and manufacturing processes, making him a key figure in this important area of research.