Chin-Ta Chen

Title: Innovations of Chin-Ta Chen in Semiconductor Manufacturing

Introduction

Chin-Ta Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 3 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor device production.

Latest Patents

Chin-Ta Chen's latest patents include a method of manufacturing semiconductor devices that involves forming a pattern over an underlying layer. This method includes creating a first pattern with main patterns and a lateral protrusion, followed by the formation of a hard mask layer. A planarization operation is performed to expose the first pattern while protecting the lateral protrusion. The underlying layer is then patterned using the hard mask pattern as an etching mask. Another patent describes a method of manufacturing a semiconductor device that includes forming an underlying structure in two areas over a substrate, followed by the formation and selective removal of layers to achieve desired transparency and patterning.

Career Highlights

Chin-Ta Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to the advancement of semiconductor technologies.

Collaborations

Chin-Ta Chen has collaborated with notable colleagues such as Hua-Tai Lin and Han-Wei Wu. Their combined efforts have furthered research and development in semiconductor manufacturing processes.

Conclusion

Chin-Ta Chen's contributions to semiconductor manufacturing through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in technology and manufacturing processes.