Suwon, South Korea

Chin Mo Kim

This inventor holds 22 USPTO granted patents and 7 published patent applications, primarily in Antenna Technology. Top assignees: Samsung Electro-Mechanics Co., Ltd., Samsung Electro-Mechanics. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chin Mo Kim. Retrieved from https://idiyas.com/inventor/chin-mo-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 95.5

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2018-2026

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Areas of Expertise:
Tantalum Capacitor
Antenna Device
Dielectric Composition
Multilayer Ceramic Capacitor
Chip Antenna
Array Antenna
Dielectric Powder
Common Mode Filter
Magnetic Permeability
High Frequency Characteristics
22 patents (USPTO):Explore Patents

Title: Innovations in Antenna Technology by Chin Mo Kim

Introduction

Chin Mo Kim, based in Suwon-si, Korea, is a distinguished inventor known for his significant contributions to the field of antenna technology. With an impressive portfolio of 21 patents, Kim's work has substantially advanced the technological landscape, particularly in the development of innovative antenna devices.

Latest Patents

Among his latest inventions, Chin Mo Kim has developed an advanced antenna device. This device features a unique structure composed of multiple dielectric layers, including a first, second, and third dielectric layer. The design incorporates both a first antenna and a second antenna, each equipped with a corresponding feed via and antenna patches. Notably, the second dielectric layer is specifically designed to have a lower dielectric constant than the other layers, further enhancing its performance through a strategically placed cavity that overlaps with the second antenna patch.

Additionally, Kim has patented another innovative antenna that consists of a first, second, and third insulating layer. This design includes a multi-part feed via that ensures effective signal transmission by connecting to an antenna patch located on the first insulating layer. The variation in permittivities among the insulating layers allows for improved functionality, offering a broader width in the third portion of the feed via compared to the first and second portions.

Career Highlights

Chin Mo Kim's career at Samsung Electro-Mechanics Co., Ltd. has been marked by his robust focus on antenna innovations. His persistent dedication to research and development has positioned him as a key player in advancing the capabilities of modern communication technologies, making significant strides within a competitive industry.

Collaborations

During his tenure, Kim has collaborated with esteemed colleagues, including Jae Yeong Kim and Sung Yong An. These collaborations have fostered a rich environment for innovation, allowing for the exchange of ideas and expertise that enhance the overall impact of their projects.

Conclusion

In conclusion, Chin Mo Kim stands out as a prolific inventor in antenna technology with his 21 patents reflecting his innovative spirit and dedication to excellence in engineering. His work not only propels advancements at Samsung Electro-Mechanics Co., Ltd. but also contributes to the broader field of communications technology, promising new opportunities for the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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