This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Innovations by Chin-Ming Ke in Optical Measurement Technologies.
Introduction
Chin-Ming Ke is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of optical measurement, particularly in the measurement of critical dimensions of anisotropic materials. His work is essential for advancing technologies in semiconductor manufacturing.
Latest Patents
Chin-Ming Ke holds a patent titled "Extracting ordinary and extraordinary optical characteristics for critical dimension measurement of anisotropic materials." This patent describes methods and apparatus for measuring a critical dimension of an optically-anisotropic feature. It includes extracting values that describe the optically-anisotropic feature, such as ordinary and extraordinary measurements of various optical characteristics. The optical characteristics can include the index of refraction and the extinction coefficient of the feature. The values obtained can be input into an optical critical dimension (OCD) measurement model, allowing for verification of the critical dimension through optical measurement. Additionally, the measurement can be verified using scanning electron microscope (SEM) techniques. The optically-anisotropic feature may consist of a substantially amorphous composition, such as amorphous carbon.
Career Highlights
Chin-Ming Ke is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in optical measurement technologies. His innovative approaches have contributed to the efficiency and accuracy of critical dimension measurements in semiconductor processes.
Collaborations
Chin-Ming Ke has collaborated with notable colleagues, including Tsai-Sheng Gau and Jacky Huang. Their teamwork has fostered advancements in the field of optical measurement.
Conclusion
Chin-Ming Ke's contributions to optical measurement technologies are significant, particularly in the context of semiconductor manufacturing. His patent and collaborative efforts highlight the importance of innovation in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile