Hsinchu, Taiwan

Chin-Han Meng

USPTO Granted Patents = 7 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2018-2021

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7 patents (USPTO):Explore Patents

Title: Innovations by Chin-Han Meng

Introduction

Chin-Han Meng is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on methods and structures that enhance the efficiency and effectiveness of semiconductor fabrication processes.

Latest Patents

One of his latest patents is a method of fabricating a semiconductor structure. This method includes forming a mask layer on a semiconductor substrate and anisotropically etching the substrate to create a cavity. The process involves multiple cycles of passivating and etching steps, with varying duration ratios to optimize the etching process. Another notable patent is for a multi-zone gas distribution plate (GDP) designed for high uniformity in plasma-based etching. This innovation includes a housing that defines a process chamber and a GDP that effectively distributes process gas through various zones, each with distinct cross-sectional profiles.

Career Highlights

Chin-Han Meng works at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to advancements in semiconductor manufacturing techniques.

Collaborations

He has collaborated with notable colleagues, including Jr-Sheng Chen and Lin-Ching Huang, to further enhance the development of semiconductor technologies.

Conclusion

Chin-Han Meng's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor fabrication processes.

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