Chin Chung Nien

Title: Innovations of Chin Chung Nien

Introduction

Chin Chung Nien is a notable inventor based in Jhudong, Taiwan. He has made significant contributions to the field of nano-imprint technology, holding 2 patents that showcase his innovative approach to monitoring mold deformation.

Latest Patents

One of his latest patents is titled "Nano-imprint system with mold deformation detector and method of monitoring the same." This invention discloses a system for real-time monitoring of mold deformation during the nano-imprinting process. An electrostatic plate capacitor is embedded in the mold, serving as a deformation detector. The capacitor consists of two opposite metal film electrodes formed by silicon micromachining techniques on opposite surfaces of the mold and connected by a metal lead. During the imprinting process, external forces act upon the mold, causing deformation that induces changes in the distance between the metal film electrodes. This results in variations in the capacitance of the capacitor, allowing for the assessment of mold deformation by comparing capacitance with a reference. The invention enables real-time detection and monitoring of the nano-imprint mold's deformation.

Another significant patent is the "In-situ monitoring method and system for mold deformation in nanoimprint." This invention provides a method for in-situ real-time monitoring of mold deformation using a database to store temporary information. The process involves several steps, including providing a mark on the mold body for easy observation, installing a signal source and monitoring device, transforming deformation quantities into computer signals for database storage, and issuing control or warning signals to the imprinting machine based on the processed results.

Career Highlights

Chin Chung Nien has established himself as a prominent figure in the field of nano-imprint technology. His innovative patents reflect his dedication to advancing the technology and improving the efficiency of the imprinting process.

Collaborations

Chin Chung Nien has collaborated with fellow inventor Hong Hocheng, contributing to the development of advanced technologies in their field.

Conclusion

Chin Chung Nien's contributions to nano-imprint technology through his innovative patents demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry and pave the way for future innovations.