The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2007

Filed:

Mar. 02, 2004
Applicants:

Hong Hocheng, Hsinchu City 300, TW;

Chin Chung Nien, Jhudong Township, Hsinchu County 300, TW;

Inventors:

Hong Hocheng, Hsinchu City 300, TW;

Chin Chung Nien, Jhudong Township, Hsinchu County 300, TW;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 43/58 (2006.01); B29C 45/76 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for nano-imprint with mold deformation detector is disclosed for real-time monitoring of the deformation of the mold. An electrostatic plate capacitor is embedded in the mold, serving as the deformation detector. The capacitor includes two opposite metal film electrodes formed by silicon micromachining technique on opposite surfaces of the mold and connected by a metal lead. During imprinting, the mold is acted upon by an external force and deformation occurs, which induces change of distance between the metal film electrodes and thus variation of the capacitance of the capacitor. The amount of deformation of the mold can then be assessed by comparing the capacitance with a reference. Thus, real-time detection and monitoring of the deformation of the nano-imprint mold is realized. Also disclosed is a method for carrying out the real-time monitoring of the deformation of the mold.


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