Kaohsiung, Taiwan

Chih-Yung Yang


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Chih-Yung Yang: Innovator in Semiconductor Technology

Introduction

Chih-Yung Yang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work is recognized for its impact on the manufacturing processes of semiconductor devices.

Latest Patents

Chih-Yung Yang holds a patent for a semiconductor device and method of manufacturing the same. This patent describes a semiconductor substrate that includes an interconnection structure and a dielectric layer. The dielectric layer surrounds the interconnection structure and defines a first cavity. The first cavity is characterized by a first sidewall, a second sidewall, and a first surface of the dielectric layer. Notably, the first sidewall is laterally displaced from the second sidewall. This innovation enhances the efficiency and effectiveness of semiconductor devices.

Career Highlights

Chih-Yung Yang is currently employed at Advanced Semiconductor Engineering, Inc., a leading company in the semiconductor industry. His role at the company allows him to apply his expertise and contribute to cutting-edge advancements in semiconductor technology.

Collaborations

Chih-Yung Yang has collaborated with notable colleagues, including Chai-Chi Lin and Chih-Cheng Lee. These collaborations have fostered a productive environment for innovation and development within the semiconductor field.

Conclusion

Chih-Yung Yang's contributions to semiconductor technology through his patent and work at Advanced Semiconductor Engineering, Inc. highlight his role as an influential inventor. His innovative approach continues to shape the future of semiconductor manufacturing.

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