Hsinchu, Taiwan

Chih-Yu Tsai


Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2017-2023

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7 patents (USPTO):Explore Patents

Title: Chih-Yu Tsai: Innovator in Inductor Structures

Introduction

Chih-Yu Tsai is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of electrical engineering, particularly in the design and development of inductor structures. With a total of seven patents to his name, Tsai's work has had a notable impact on the industry.

Latest Patents

One of Tsai's latest patents is an innovative inductor structure. This design includes a first curve metal component, a second curve metal component, a connection component, and a capacitor. The first and second curve metal components are positioned on a layer located at a first plane, while the components themselves are situated at a second plane. The connection component links the first and second curve metal components, enhancing the overall functionality of the inductor. Additionally, Tsai has developed a patterned shielding structure that is placed between the inductor structure and a substrate. This shielding structure comprises a shielding layer and a first stacked structure, which is designed to improve the shielding effect.

Career Highlights

Throughout his career, Chih-Yu Tsai has worked with notable companies such as Realtek Semiconductor Inc. and the Industrial Technology Research Institute. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.

Collaborations

Tsai has collaborated with talented individuals in his field, including Hsiao-Tsung Yen and Kai-Yi Huang. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Chih-Yu Tsai is a distinguished inventor whose work in inductor structures and shielding technologies has advanced the field of electrical engineering. His contributions continue to influence the industry and inspire future innovations.

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