The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2017

Filed:

Mar. 09, 2015
Applicant:

Realtek Semiconductor Corporation, Hsinchu, TW;

Inventors:

Chih-Yu Tsai, Hsinchu, TW;

Kai-Yi Huang, Taipei, TW;

Hsiao-Tsung Yen, Hsinchu, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H03H 7/01 (2006.01); H01F 27/28 (2006.01); H03H 5/00 (2006.01); H03H 5/12 (2006.01);
U.S. Cl.
CPC ...
H03H 7/0115 (2013.01); H01F 27/2804 (2013.01); H03H 5/006 (2013.01); H03H 5/12 (2013.01);
Abstract

The present invention discloses an LC tank capable of reducing electromagnetic radiation by itself and the manufacturing method of the same. An embodiment of said LC tank comprises: a first tank area whose boundary is defined by a first part of an inductance; a second tank area whose boundary is defined by a second part of the inductance in which the second part includes a gap; a cross-interconnection structure operable to electrically connect the first and second parts of the inductance and distinguish the first tank area from the second tank area; and at least one capacitance formed inside at least one of the first and second tank areas, wherein the area ratio of the first tank area to the second tank area is between 20% and 80%.


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