San Jose, CA, United States of America

Chih-Yu Jen

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.5

ph-index = 1


Company Filing History:


Years Active: 2021-2025

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4 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Chih-Yu Jen - Leading the Way in Charged Particle Beam Inspection

Introduction:

Chih-Yu Jen, a distinguished innovator based in San Jose, CA, has made significant contributions to the field of charged particle beam inspection. With a keen focus on detecting time-dependent defects in advanced device structures, his work stands at the forefront of innovation in semiconductor manufacturing.

Latest Patents:

Chih-Yu Jen's recent patents showcase his expertise in developing cutting-edge inspection apparatus for identifying thin device structure defects and fast-charging defects. His invention of the "Time-dependent defect inspection apparatus" demonstrates an enhanced charged particle beam inspection system capable of detecting subtle voltage contrast differences in wafer structures over a time sequence. Additionally, the "Apparatus and method for detecting time-dependent defects in a fast-charging device" highlights his innovative approach to scanning mechanisms for swift identification of fast-charging defects on wafers.

Career Highlights:

Employed at ASML Netherlands B.V., a leading technology company in the semiconductor industry, Chih-Yu Jen brings his remarkable skills to the forefront of wafer inspection technology. With a track record of three patents to his name, he continues to push the boundaries of innovation in semiconductor manufacturing processes.

Collaborations:

Collaborating with esteemed colleagues such as Long Ma and Yongjun Wang, Chih-Yu Jen harnesses a collective expertise in charged particle beam inspection. Together, they strive to enhance wafer inspection techniques and drive forward advancements in defect detection methodologies.

Conclusion:

In conclusion, Chih-Yu Jen's work in developing advanced charged particle beam inspection systems has propelled him to the forefront of innovation in semiconductor manufacturing. With a focus on detecting time-dependent defects and fast-charging anomalies, his contributions are instrumental in ensuring the quality and reliability of semiconductor devices in the ever-evolving technology landscape.

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