The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2021
Filed:
Sep. 18, 2019
Asml Netherlands B.v., Veldhoven, NL;
Long Ma, San Jose, CA (US);
Chih-Yu Jen, San Jose, CA (US);
Zhonghua Dong, Sunnyvale, CA (US);
Peilei Zhang, San Jose, CA (US);
Wei Fang, Milpitas, CA (US);
Chuan Li, San Jose, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An improved charged particle beam inspection apparatus, and more particularly, a particle beam apparatus for inspecting a wafer including an improved scanning mechanism for detecting fast-charging defects is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source that delivers charged particles to an area of the wafer and scans the area. The improved charged particle beam apparatus may further include a controller including a circuitry to produce multiple images of the area over a time sequence, which are compared to detect fast-charging defects.