Location History:
- Chunghua, TW (2003)
- Hsinchu, TW (2006 - 2008)
Company Filing History:
3 out of 9,152 
1 out of 103 Years Active: 2003-2008
Title: Innovations of Chih-Shin Chuang
Introduction
Chih-Shin Chuang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photoresist compositions, which are essential in photolithography processes. With a total of three patents to his name, Chuang's work has advanced the technology used in semiconductor manufacturing.
Latest Patents
Chuang's latest patents include a negative photoresist composition and a positive photoresist composition. The negative photoresist composition involves a multi-reaction model that enhances light reaction efficiency and increases reaction thoroughness, resulting in high-resolution patterns. The positive photoresist composition is designed for thick film lithography processes and features uniform reactivity, allowing for high aspect ratio and resolution profiles in the resulting photoresist patterns.
Career Highlights
Throughout his career, Chih-Shin Chuang has worked with prominent organizations such as the Industrial Technology Research Institute and Chang Chun Plastics Co., Ltd. His experience in these institutions has allowed him to refine his expertise in photoresist technology and contribute to various innovative projects.
Collaborations
Chuang has collaborated with notable coworkers, including Tsing-Tang Song and Wei-Chan Tseng. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Chih-Shin Chuang's contributions to the field of photoresist compositions have made a significant impact on semiconductor manufacturing. His innovative patents and collaborative efforts highlight his dedication to advancing technology in this critical area.