The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2008
Filed:
Nov. 24, 2003
Tsing-tang Song, Ilan, TW;
Chih-shin Chuang, Hsinchu, TW;
Wei-chan Tseng, Tainan, TW;
Kuen-yuan Hwang, Taipei, TW;
Tsung-yu Chen, Taipei, TW;
Tsing-Tang Song, Ilan, TW;
Chih-Shin Chuang, Hsinchu, TW;
Wei-Chan Tseng, Tainan, TW;
Kuen-Yuan Hwang, Taipei, TW;
Tsung-Yu Chen, Taipei, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Chang-Chun Plastics Co., Ltd., Hsinchu County, TW;
Abstract
This invention relates to a negative photoresist composition with multi-reaction models. When the photoresist composition according to the present invention is used in photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization also occur. The photoresist composition can be used to control light reaction efficiency and increase reaction thoroughness, thus obtaining a high resolution pattern.