Chih-Min Wen

Title: Innovations of Chih-Min Wen

Introduction

Chih-Min Wen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patents. With a total of 2 patents, Wen has demonstrated his expertise and commitment to advancing technology.

Latest Patents

Wen's latest patents include a "Method and apparatus for chemical mechanical polishing including first and second polishing." This invention outlines a method for performing first and second polishings on a workpiece using different operating parameters. Another significant patent is the "Al-Cu alloy sputtering method with post-metal quench." This invention relates to a method of fabricating metal wiring, where sputtered metal is rapidly cooled by a post-metal quenching process to prevent harmful CuAl precipitation. The process involves forming a TiN reactively sputtered bottom barrier layer, followed by a sputtered Al-Cu alloy wiring layer, and then an in situ post-metal quench, which effectively cools the substrate from high temperatures to near room temperature in a short time frame.

Career Highlights

Chih-Min Wen works at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in enhancing the efficiency and reliability of semiconductor devices.

Collaborations

Wen has collaborated with notable colleagues, including Chen-Hsiang Liao and Cheng-Shien Chen, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Chih-Min Wen's innovative patents and contributions to the semiconductor industry highlight his role as a key inventor in advancing technology. His work continues to influence the field and pave the way for future innovations.