Chih-Hsiung Chang

Title: Chih-Hsiung Chang: Thin-Film and Display Technology Patents.

Introduction

Chih-Hsiung Chang is an inventor based in Taichung, Taiwan. His patent work includes technologies for polysilicon films, thin-film transistors, and sequential lateral solidification masks. He is associated with AU Optronics Corporation and is credited with 5 patents.

Latest Patents

Chang’s listed patents include “Polysilicon Film, Thin Film Transistor Using the Same, and Method for Forming the Same.” The invention describes forming an activated layer on a substrate, depositing an amorphous silicon film over it, and annealing the film to crystallize it into polycrystalline silicon. The activated layer’s molecular structure includes carbon, hydrogen, oxygen, and silicon.

Another listed patent is “Sequential Lateral Solidification Mask.” It describes a mask with parallel repeating patterns made up of first and second units. Each unit contains light-transmitting and light-absorbing portions, and the first and second units are arranged in mirror symmetry across a major axis.

Career Highlights

Chang’s patent portfolio reflects work on materials and processes relevant to display manufacturing. His inventions address both the formation of polycrystalline silicon films and mask structures used in sequential lateral solidification.

Collaborations

Chang’s listed coworkers include Chia-Tien Peng and Tsung-Yi Hsu. His company affiliation is AU Optronics Corporation.

Conclusion

Chih-Hsiung Chang’s patents focus on thin-film and display-related technologies, including polysilicon film formation and sequential lateral solidification masks.