Chih-How Chang

Title: Chih-How Chang: Innovator in Semiconductor Fabrication

Introduction

Chih-How Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor fabrication, holding a total of 2 patents. His innovative methods have advanced the technology used in trench isolation, which is crucial for the performance of semiconductor devices.

Latest Patents

Chih-How Chang's latest patents include a "Method for Fabricating Trench Isolation" and a "Method for Fabricating Trench Isolations with High Aspect Ratio." The first patent describes a method for forming trench isolation by providing a semiconductor substrate with an opening, applying a mask layer, and filling the trench with a first insulating layer. This process involves anisotropically etching the first insulating layer and forming a second insulating layer to achieve the desired isolation. The second patent focuses on achieving void-free trench isolation with a high aspect ratio through a series of precise steps, including low-pressure chemical vapor deposition and chemical-mechanical polishing.

Career Highlights

Chih-How Chang is currently employed at Nan Ya Technology Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in enhancing the efficiency and reliability of semiconductor devices.

Collaborations

Chih-How Chang has collaborated with notable colleagues such as Sheng-Wei Yang and Wen-Sheng Liao. Their combined expertise has contributed to the successful development of advanced semiconductor fabrication techniques.

Conclusion

Chih-How Chang's contributions to semiconductor fabrication through his innovative patents have significantly impacted the industry. His work at Nan Ya Technology Corporation and collaborations with esteemed colleagues further highlight his role as a leading inventor in this field.