Chih Chieh Chen

Title: Innovations by Chih Chieh Chen in Semiconductor Manufacturing

Introduction

Chih Chieh Chen is a notable inventor based in Taoyuan County, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase his innovative approaches.

Latest Patents

One of his latest patents is a method for removing hard masks on gates in the semiconductor manufacturing process. This method involves forming a first gate and a second gate with hard masks on a semiconductor substrate, where the second gate is larger than the first. The gates are associated with silicon-germanium (SiGe) source and drain regions to form p-type transistors. A photoresist layer is then deposited, and an opening is created on the hard mask of the second gate. The photoresist layer on both gates is completely removed by etching back, ensuring that there is no residue left. This allows for the complete removal of the hard masks on both gates.

Career Highlights

Chih Chieh Chen works at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work has been instrumental in advancing manufacturing processes that enhance the efficiency and effectiveness of semiconductor production.

Collaborations

He collaborates with esteemed colleagues such as Hung Chih Tsai and Sheng Chen Chung, contributing to a dynamic and innovative work environment.

Conclusion

Chih Chieh Chen's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in technology and manufacturing processes.