Chih-Che Lin

Title: Chih-Che Lin: Semiconductor Processing and Lithography Innovations.

Introduction

Chih-Che Lin is an inventor based in Hsinchu, Taiwan. His patent work focuses on semiconductor manufacturing, including lithography processes, contamination monitoring, and wafer handling. He is associated with Taiwan Semiconductor Manufacturing Company Limited and is credited with 4 patents.

Latest Patents

“Contamination Handling for Semiconductor Apparatus” describes a lithography apparatus that monitors contamination left on the apparatus’s sidewalls during photoresist coating. A detection unit assesses the contamination level, and a controller adjusts apparatus operations according to whether that level meets a baseline cleanliness requirement.

“Processing Apparatus and Method Thereof” describes a wafer-processing sequence in which a robot arm transfers a wafer among chambers for photoresist coating, pattern exposure, and development. The method also includes cleaning the robot arm in a dummy chamber.

Career Highlights

Lin’s listed inventions address practical challenges in semiconductor fabrication. His work includes monitoring equipment cleanliness and coordinating wafer transfers across multiple processing stages.

Collaborations

Lin’s listed coworkers include Fu-Chun Hsieh and Pei-Yi Su. His company affiliation connects his patent activity with semiconductor manufacturing at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Chih-Che Lin’s patent portfolio reflects a focus on improving lithography equipment cleanliness and wafer-processing workflows in semiconductor manufacturing.