Company Filing History:
Years Active: 2021-2025
Title: Chien-Sheng Wu: Innovator in Semiconductor Technology
Introduction
Chien-Sheng Wu is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of integrated circuits. With a total of 2 patents to his name, Wu's work has had a substantial impact on the industry.
Latest Patents
Wu's latest patents include innovative methods for etching integrated circuits. One notable patent describes a method for etching a tungsten silicide (WSix) layer during the formation of a gate electrode in an integrated circuit. This method utilizes an etchant gas comprising nitrogen gas (N) and oxygen gas (O) in a specified flow ratio. The inclusion of chlorine gas (Cl) and tetrafluoromethane (CF) enhances the etching process. The selectivity of the etchant gas containing oxygen for WSix versus polysilicon is significantly higher, which reduces overetching and provides better control in producing a gate electrode. Another patent focuses on a method of forming a semiconductor device that includes top conductive pads. This method involves providing a substrate with semiconductor device elements, followed by the patterning of a top conductive pad and an anti-reflective coating over the substrate.
Career Highlights
Chien-Sheng Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.
Collaborations
Wu has collaborated with notable colleagues, including Chih-Hsien Hsu and Ya-Ping Su. These collaborations have further enhanced his research and development efforts in semiconductor technology.
Conclusion
Chien-Sheng Wu is a key figure in the advancement of semiconductor technology, with his patents reflecting his innovative approach to integrated circuit manufacturing. His contributions continue to influence the industry and pave the way for future developments.