This inventor holds 3 USPTO granted patents. Top assignee: Industrial Technology Research Institute. Active years: 1999-2001.
Location History:
- Taipei, TW (1999 - 2000)
- Hsinchu, TW (2001)
Company Filing History:
Years Active: 1999-2001
Title: Innovations of Chien-Mei Wang
Introduction
Chien-Mei Wang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on improving processes that enhance the performance and reliability of integrated circuits.
Latest Patents
Wang's latest patents include a process for plasma treatment to improve the DUV photoresist process. This innovative method involves exposing a layer, particularly an anti-reflection coating deposited by PECVD, to a high-density plasma of argon, oxygen, or a mixture of both. This exposure effectively removes all amino groups from the surface, allowing for further processing of photoresist while maintaining dimensionally stable patterns.
Another significant patent is a method for making intermetal dielectrics (IMD) on semiconductor devices. This method utilizes low dielectric constant spin-on polymers without causing via hole poisoning. The process involves sequentially depositing three IMD layers, with the first layer being a low k polymer. The subsequent layers consist of silicon nitride and silicon oxide, which protect the low k polymer during processing. This innovative approach addresses the challenges faced in conventional processing methods.
Career Highlights
Chien-Mei Wang is affiliated with the Industrial Technology Research Institute, where he continues to advance semiconductor technologies. His expertise and innovative methods have positioned him as a key figure in the field.
Collaborations
Wang collaborates with esteemed colleagues, including Lai-Juh Chen and Shyh-Dar Lee, who contribute to his research and development efforts.
Conclusion
Chien-Mei Wang's contributions to semiconductor technology through his innovative patents demonstrate his commitment to advancing the field. His work not only enhances the performance of integrated circuits but also addresses critical challenges in semiconductor manufacturing.