The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2001
Filed:
Dec. 13, 1999
Shyh-Dar Lee, Hsinchu, TW;
Chien-Mei Wang, Hsinchu, TW;
Shuo-Yen Chou, Hualien, TW;
Lai-Juh Chen, Hsinchu, TW;
Industrial Technology Research Institute, Hsin-chu, TW;
Abstract
A process for removing all amino groups adsorbed on a surface is described. The key feature of the invention is exposure of a layer, particularly an anti-reflection coating that has been deposited by means of PECVD, to a high-density plasma of either argon, oxygen, or a mixture of both. When this is done according to the teachings of the invention, all amino groups are removed from the surface and further processing of photoresist can then be initiated. Even if delays are introduced during subsequent further photoresist processing, dimensionally stable patterns are obtained.