Chieh-Ting Chen

Title: Chieh-Ting Chen: Patents in Electrode and Metal-Layer Manufacturing

Introduction

Chieh-Ting Chen is an inventor associated with Hsinchu City, Taiwan. His patent work includes methods for manufacturing electrode structures and patterned metal layers. He is associated with Mikro Mesa Technology Co., Ltd. and has 5 patents.

Latest Patents

One of Chen’s latest patents describes a method for manufacturing a structure with an electrode and anodized segments. The process forms a metal layer on a substrate and uses patterned photoresist with mask portions of different thicknesses. It anodizes part of the metal layer, removes a portion of the photoresist, and etches the metal to create a pattern. The method also includes reflowing the photoresist between anodizing and etching.

Another patent concerns manufacturing an electrode structure. It describes etching a bottom metal layer to form two metal patterns connected by a bridge, then selectively anodizing the layer using a remaining photoresist mask. A conductive layer is deposited over an unanodized area of one pattern. Further etching exposes and electrically opens the bridge.

Career Highlights

Chen’s disclosed inventions focus on manufacturing processes that combine photoresist patterning, metal etching, anodization, and conductive-layer deposition. These techniques address the formation and electrical separation of patterned electrode structures.

Collaborations

Chen is associated with Mikro Mesa Technology Co., Ltd. His coworker Li-Yi Chen is also identified in the provided information.

Conclusion

Chieh-Ting Chen’s patent work centers on methods for producing patterned metal and electrode structures, including processes that use anodization and controlled etching.