The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12727224 B1

Date of Patent:

Sep. 01, 2026

Filed:

Dec. 06, 2023

Method of manufacturing structure having a metal layer including electrode and anodized segments through the use of patterned photoresist

Applicant:

Mikro Mesa Technology Co., Ltd., Apia, WS;

Inventors:

Li-Yi Chen, Tainan City, TW;

Chieh-Ting Chen, Hsinchu City, TW;

Assignee:

MIKRO MESA TECHNOLOGY CO., LTD., Apia, WS;

Attorney:

CKC & Partners Co., LLC

Primary Examiner:

Davienne N Monbleau

Assistant Examiner:

Dmitri undefined Mihaliov

Int. Cl.

CPC ...

H10D 64/01 (2025.01); H10P 50/00 (2026.01); H10P 50/26 (2026.01); H10P 76/20 (2026.01);

U.S. Cl.

CPC ...

H10D 64/01354 (2026.01); H10P 50/267 (2026.01); H10P 50/71 (2026.01); H10P 76/2041 (2026.01); H10P 76/20 (2026.01);

Abstract

A method of manufacturing a structure having an electrode and an anodized part includes: forming a top metal layer on a substrate; forming a top patterned photoresist on the top metal layer to expose a portion of a top surface of the top metal layer, in which the top patterned photoresist has a first mask portion and a second mask portion thicker than the first mask portion; anodizing the top metal layer through the top patterned photoresist to form an anodized segment; removing the first mask portion after the anodizing; etching the top metal layer through the top patterned photoresist after the removing the first mask portion to form a top metal pattern; and reflowing the top patterned photoresist after the anodizing and before the etching.

Find Patent Forward Citations

Chen, Li-Yi. (2026). Method of manufacturing structure having a metal layer including electrode and anodized segments through the use of patterned photoresist (U.S. Patent No. 12727224). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12727224

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile