The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2026
Filed:
Dec. 06, 2023
Mikro Mesa Technology Co., Ltd., Apia, WS;
Li-Yi Chen, Tainan City, TW;
Chieh-Ting Chen, Hsinchu City, TW;
MIKRO MESA TECHNOLOGY CO., LTD., Apia, WS;
Abstract
A method of manufacturing a structure having multi metal layers includes: depositing a top metal layer on a bottom metal layer; forming a patterned photoresist on the top metal layer; etching the top and bottom metal layers through first hollow portions of the patterned photoresist to respectively form a top metal pattern and a bottom metal pattern; forming a second hollow portion in the patterned photoresist to expose a portion of the top metal pattern; etching the top metal pattern through the second hollow portion until a top surface portion of the bottom metal pattern is exposed by the etched top metal pattern, in which an etch selectivity of the top and bottom metal layers in the etching the top metal pattern is greater than 1.0; and anodizing the top surface portion to form an anodized segment of the bottom metal layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile