Chie-Chieh Lin

Title: Innovations of Chie-Chieh Lin

Introduction

Chie-Chieh Lin is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of integrated circuit design and fabrication. With a total of 2 patents to his name, Lin's work focuses on improving lithography processes essential for semiconductor manufacturing.

Latest Patents

Chie-Chieh Lin's latest patents include a "Method for making a lithography mask" and a "Method for improving resist pattern peeling." The first patent describes a method of fabricating a mask that involves receiving an integrated circuit (IC) design layout with spatially related pattern layers. The method modifies the IC design layout by adjusting the dimensions of features based on their spatial relationships. It also includes generating tape-out data for mask making and applying a logic operation to the IC design layout. The second patent similarly focuses on the fabrication of a mask, detailing a process that enhances the peeling of resist patterns, ensuring better accuracy and efficiency in semiconductor production.

Career Highlights

Chie-Chieh Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in IC design and lithography has positioned him as a valuable asset in the field.

Collaborations

Lin has collaborated with notable colleagues, including Yu-Lun Liu and Chia-Chu Liu, who contribute to the innovative environment at their workplace.

Conclusion

Chie-Chieh Lin's contributions to the semiconductor industry through his patents and collaborative efforts highlight his role as an influential inventor. His work continues to impact the efficiency and effectiveness of integrated circuit manufacturing processes.