Richardson, TX, United States of America

Chidi P R Chidambaram


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Chidi P R Chidambaram: Innovator in CMOS Technology

Introduction

Chidi P R Chidambaram is a notable inventor based in Richardson, TX (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of CMOS (Complementary Metal-Oxide-Semiconductor) processes. His innovative work has led to advancements that enhance the efficiency and performance of semiconductor devices.

Latest Patents

Chidambaram holds a patent titled "Method of CMOS source/drain extension with the PMOS implant spaced by poly oxide and cap oxide from the gates." This patent describes an improved source/drain extension process that includes specific processing steps to cover the wafer and dry etching steps. These steps provide side wall spacers of poly oxide and/or cap oxide from the PMOS gate areas before conducting PMOS implanting steps. The capping of the wafer with cap oxide after the NMOS implant prevents arsenic from out-diffusing from the silicon, ensuring better performance of the semiconductor devices.

Career Highlights

Chidambaram is associated with Texas Instruments Corporation, a leading company in the semiconductor industry. His work at Texas Instruments has allowed him to contribute to cutting-edge technologies that are essential for modern electronic devices. His innovative approaches have been instrumental in improving manufacturing processes and device performance.

Collaborations

Chidambaram has collaborated with notable colleagues, including Donald S Miles and Douglas Ticknor Grider. These collaborations have fostered an environment of innovation and have led to the successful development of advanced semiconductor technologies.

Conclusion

Chidi P R Chidambaram is a distinguished inventor whose work in CMOS technology has made a significant impact on the semiconductor industry. His patent and contributions reflect his commitment to innovation and excellence in engineering.

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