Hsin-Chu, Taiwan

Chia-Yu Lee

USPTO Granted Patents = 24 

 

Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 59(Granted Patents)


Location History:

  • Banciao, TW (2008)
  • Taipei Hsien, TW (2010 - 2012)
  • Taipei County, TW (2012 - 2014)
  • New Taipei, TW (2015)
  • Hsinchu, TW (2010 - 2024)

Company Filing History:


Years Active: 2008-2025

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24 patents (USPTO):Explore Patents

Title: Innovations by Chia-Yu Lee: A Pioneer in Lithography Technologies

Introduction

Chia-Yu Lee, a notable inventor located in Hsin-Chu, Taiwan, has made significant contributions to the field of lithography with a remarkable portfolio of 23 patents. His innovative work has not only advanced technology in semiconductor manufacturing but has also set new standards in the industry.

Latest Patents

Among his latest patents, Chia-Yu Lee has developed groundbreaking technologies aimed at improving EUV (Extreme Ultraviolet) wafer defect reduction and the effective collection of nonconductive particles. One of his notable inventions is an EUV lithographic apparatus featuring a wafer stage and a particle removing assembly designed to clean wafers for extreme ultraviolet lithography. This apparatus enhances the cleanliness of the wafer surface by efficiently directing debris away from the chamber and preventing contamination during the lithography process. The integration of particle removing electrodes, an exhaust device, and turbomolecular pumps allows for precise control of airflow and debris removal, significantly enhancing the overall performance of the lithographic process.

Career Highlights

Chia-Yu Lee has held prominent positions at leading companies within the semiconductor industry. He has contributed his expertise at Au Optronics Corporation and Taiwan Semiconductor Manufacturing Company Limited, where he played vital roles in the development of advanced manufacturing technologies.

Collaborations

Throughout his career, Chia-Yu Lee has collaborated with skilled professionals, including colleagues Chin-An Tseng and Yen-Heng Huang. These collaborations have fostered innovation and have been instrumental in driving forward the development of new technologies that address various challenges in lithography.

Conclusion

Chia-Yu Lee's dedication to innovation and his extensive experience in the semiconductor industry highlight his role as a key figure in advancing lithographic techniques. His latest patents reflect a commitment to improving manufacturing processes, ensuring the production of high-quality semiconductor devices. With a strong foundation in research and collaboration, Chia-Yu Lee continues to inspire and influence the future of technology in his field.

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