Hsinchu, Taiwan

Chia-Yi Lin

This inventor holds 3 USPTO granted patents. Top assignee: National Applied Research Laboratories. Active years: 2011-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chia-Yi Lin. Retrieved from https://idiyas.com/inventor/chia-yi-lin-9kj2bvi3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Hsinchu, TW (2011 - 2013)
  • Taipei, TW (2015)

Company Filing History:


Years Active: 2011-2015

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3 patents (USPTO):Explore Patents

Title: Chia-Yi Lin: Innovator in Semiconductor Technology

Introduction

Chia-Yi Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advancements in thin-film transistors and nanowire fabrication methods.

Latest Patents

One of his latest patents is titled "Thin film transistor and fabricating method." This invention describes a thin-film transistor that includes a semiconductor panel, a dielectric layer, a semiconductor film layer, a conduct layer, a source, and a drain. The semiconductor panel consists of a base, an intra-dielectric layer, at least one metal wire layer, and at least one via layer. The dielectric layer is stacked on the semiconductor panel, while the semiconductor film layer is placed on top of the dielectric layer. The conduct layer is formed on the semiconductor film layer, with the source and drain strategically positioned on adjacent vias that connect to the gate via. Additionally, a fabricating method for a thin-film transistor with metal-gates and nanowires is disclosed.

Another significant patent is the "Nanowire fabrication method and semiconductor element using nanowire fabricated thereby." This invention outlines a method for fabricating nanowires and utilizing them in semiconductor elements. The process involves several steps, including providing a substrate, depositing layers of silicon dioxide and silicon nitride, and forming a patterned photoresist layer. The method ultimately leads to the creation of nanowires on a dielectric layer, enhancing the functionality of semiconductor devices.

Career Highlights

Chia-Yi Lin is currently employed at the National Applied Research Laboratories, where he continues to innovate in semiconductor technologies. His work has been instrumental in advancing the capabilities of thin-film transistors and nanowire applications.

Collaborations

Chia-Yi Lin collaborates with notable colleagues, including Min-Cheng Chen and Hou-Yu Chen. Their combined expertise contributes to the success of their research and development efforts.

Conclusion

Chia-Yi Lin is a key figure in the semiconductor industry, with a focus on innovative technologies that enhance electronic devices. His patents reflect his commitment to advancing the field and improving the functionality of semiconductor components.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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