Chia-Shia Tsai

Title: Chia-Shia Tsai: Innovator in Semiconductor Technology

Introduction

Chia-Shia Tsai is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approach to solving complex engineering challenges.

Latest Patents

One of his latest patents is titled "Underlayer protection for the dual damascene etching." This invention focuses on a method of protecting an underlying diffusion barrier layer during the dual damascene trench and via etch process. The process begins with via hole etching in an intermetal dielectric (IMD) layer, followed by the deposition and patterning of a thin film barrier layer. A key step involves applying a coating of negative photoresist, which is exposed and developed to partially fill the via openings. This thick layer of negative photoresist effectively protects the thin diffusion barrier layer from subsequent etch processing.

Another notable patent is the "Edge defect inhibited trench etch plasma etch method." This method involves etching a trench within a silicon oxide layer. It starts with providing a substrate, followed by forming a silicon oxide layer over it. A masking layer is then applied, and the silicon oxide layer is etched using a plasma etch method. The etchant gas composition used in this method includes octafluorocyclobutane and at least one of carbon tetrafluoride, difluoromethane, hexafluoroethane, and oxygen, while excluding any carbon and oxygen-containing gas.

Career Highlights

Chia-Shia Tsai is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in advancing etching techniques that are critical for the fabrication of integrated circuits.

Collaborations

Throughout his career, Chia-Shia has collaborated with notable colleagues, including Jen-Cheng Liu and Chao-Cheng Chen. These partnerships have fostered a collaborative environment that enhances the innovation process.

Conclusion

Chia-Shia Tsai's contributions to semiconductor technology through his patents demonstrate his expertise and commitment to innovation. His work not only advances the field but also sets a foundation for future developments in semiconductor manufacturing.