Chia-Piao Lee

Title: Innovations by Chia-Piao Lee in Semiconductor Technology

Introduction

Chia-Piao Lee is a notable inventor based in Yongkang, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of photoresist scum prevention during etch processes.

Latest Patents

Chia-Piao Lee holds 1 patent for his innovative work titled "Prevention of trench photoresist scum." This patent discloses methods for preventing photoresist scum formation during the etching processes used for patterning material layers in semiconductor devices. The treatment involves the use of nitrogen and oxygen to inhibit the formation of photoresist scum. This treatment can be performed in-situ and may occur during or after the etch process, or both. It is especially beneficial when applied during the patterning of low dielectric constant material layers and for the formation of isolated via patterns.

Career Highlights

Chia-Piao Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to advance semiconductor manufacturing technologies. His work has been instrumental in improving the efficiency and effectiveness of etching processes in the industry.

Collaborations

Chia-Piao Lee collaborates with his coworker, Yin-Shen Chu, to further enhance their research and development efforts in semiconductor technology.

Conclusion

Chia-Piao Lee's innovative contributions to semiconductor technology, particularly in preventing photoresist scum formation, highlight his importance in the field. His work continues to influence advancements in semiconductor manufacturing processes.