Chia-Lin Chu

Title: Chia-Lin Chu: Innovator in Printing Technology

Introduction

Chia-Lin Chu is a notable inventor based in Brookfield, WI (US), recognized for her contributions to the field of printing technology. With a total of 4 patents to her name, she has made significant advancements that enhance the efficiency and quality of printing processes.

Latest Patents

Chia-Lin Chu's latest patents focus on innovative methods for ink key control in printing presses. One of her patents describes a method for determining ink key control settings for multiple ink keys in a printing press. This method ensures that the correct amount of ink is supplied to rollers, which then transfer the ink to specific zones on a substrate for image printing. The press model she developed relates image requirements to ink key control settings, incorporating a gain and offset for each ink key. This model tracks the drift in offsets by comparing predicted control settings with actual settings after a press job is completed. Another patent addresses the correction of ink back-flow and lateral flow effects in web-offset printing presses. It utilizes a plate coverage equation to compensate for ink back-flow into the ink reservoir and employs an ink key distribution function to mitigate the blurring effects caused by lateral ink spread.

Career Highlights

Chia-Lin Chu has established herself as a key figure in the printing industry through her work at Quadtech, Inc. Her innovative approaches have not only improved printing technology but have also contributed to the overall efficiency of printing operations.

Collaborations

Chia-Lin has collaborated with notable colleagues, including John C. Seymour and Jeffrey P. Rappette, to further advance the field of printing technology.

Conclusion

Chia-Lin Chu's contributions to printing technology through her patents and collaborative efforts highlight her role as an influential inventor in the industry. Her work continues to shape the future of printing processes and technology.