The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1999
Filed:
Dec. 23, 1997
Applicant:
Inventors:
John C Seymour, Jefferson, WI (US);
Chia-Lin Chu, Brookfield, WI (US);
Assignee:
Quad/Tech, Inc., Sussex, WI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41F / ;
U.S. Cl.
CPC ...
101484 ; 101365 ;
Abstract
A method is disclosed for correction of the effects of ink back-flow and lateral flow in the inking system of a web-offset printing press. A plate coverage equation dependent on plate coverage is used to compensate for ink back-flow into the ink reservoir. An ink key distribution function is utilized to correct for the blurring effects of lateral ink spread caused by the action of vibrator rollers. A correction is also made for the ink saturation effect. The method is applicable to an ink key preset system.