Chia-Feng Yeh

Title: Chia-Feng Yeh: Innovator in Optical Proximity Correction

Introduction

Chia-Feng Yeh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of computational lithography, particularly in optical proximity correction methodologies. With a total of 2 patents, Yeh's work is instrumental in enhancing lithography printability for integrated circuit designs.

Latest Patents

One of Chia-Feng Yeh's latest patents focuses on an optical proximity correction methodology using pattern classification for target placement. This innovative approach involves receiving an integrated circuit (IC) design layout that contains an IC pattern. The method generates target points for a contour corresponding to the IC pattern based on a target placement model, which is selected according to the classification of the IC pattern. The process includes performing optical proximity correction on the IC pattern using these target points, resulting in a modified IC design layout. Additionally, the method encompasses fabricating a mask based on the modified layout, thereby improving the overall lithography process.

Career Highlights

Chia-Feng Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in optical proximity correction has positioned him as a key player in advancing lithography techniques.

Collaborations

Yeh has collaborated with notable colleagues, including Hung-Chun Wang and Chi-Ping Liu, contributing to various projects that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Conclusion

Chia-Feng Yeh's innovative work in optical proximity correction methodologies showcases his dedication to improving lithography printability. His contributions are vital to the advancement of semiconductor technology, making him a noteworthy inventor in the field.