Location History:
- Westboro, MA (US) (2004)
- Westborough, MA (US) (2009 - 2013)
Company Filing History:
Years Active: 2004-2013
Title: **Chi Q Truong: Innovator in Antireflective Hard Mask Compositions**
Introduction
Chi Q Truong is an accomplished inventor based in Westborough, MA, United States. With a portfolio of three patents to his name, he has made significant contributions to the field of materials science, particularly in the development of antireflective hard mask compositions. His work has had a profound impact on the efficiency and effectiveness of photoresist technologies.
Latest Patents
Chi Q Truong's most recent patents include innovative organic-containing compositions that serve dual purposes. These compositions function as an antireflective layer for overcoated photoresist and also effectively act as a hard mask layer. They exhibit notable plasma etch selectivity from undercoated layers, making them valuable in the manufacturing process. Specifically, the preferred compositions are characterized by high silicon content and are formulated from a blend of distinct resins, showcasing Truong's commitment to advancing material properties in semiconductor technology.
Career Highlights
Throughout his career, Chi Q Truong has worked with esteemed organizations such as Rohm & Haas Electronic Materials LLC and Shipley Company, L.L.C. His experience in these companies has equipped him with the knowledge and skills necessary to drive innovation in the industry. His contributions have not only enhanced product offerings but have also paved the way for future advancements in hard mask technologies.
Collaborations
Truong's collaborative efforts with other professionals have further enriched his work. Notable collaborators include Dana A Gronbeck and Amy M Kwok, who have contributed to his projects and shared their expertise. These partnerships reflect the importance of teamwork in the innovation process and illustrate how collective knowledge can lead to groundbreaking inventions.
Conclusion
In summary, Chi Q Truong stands out as a leading inventor within the realm of antireflective hard mask compositions. With three patents to his credit and a strong professional background, his innovations continue to shape the future of semiconductor manufacturing. His commitment to advancing technologies serves as an inspiration for current and future innovators.