The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Aug. 29, 2006
Dana A. Gronbeck, Westfield, MA (US);
Amy M. Kwok, Sturbridge, MA (US);
Chi Q. Truong, Westborough, MA (US);
Michael K. Gallagher, Hopkinton, MA (US);
Anthony Zampini, Westborough, MA (US);
Dana A. Gronbeck, Westfield, MA (US);
Amy M. Kwok, Sturbridge, MA (US);
Chi Q. Truong, Westborough, MA (US);
Michael K. Gallagher, Hopkinton, MA (US);
Anthony Zampini, Westborough, MA (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.