Chi-l Lang

Title: The Innovations of Chi-l Lang: A Look into His Contributions

Introduction: Chi-l Lang, an accomplished inventor based in Cupertino, California, has made significant strides in the field of technology with a total of four patents to his name. His work primarily focuses on advanced materials and memory elements that drive efficiency and performance in electronic devices.

Latest Patents: Among Chi-l Lang's most recent patents is the innovative development of graphene barrier layers for interconnects and the associated methods for forming these barriers. This patent details the process of creating interconnect barrier layers that involve a dielectric body with a trench, where layers of amorphous carbon and metal are crucial for converting carbon to graphene. Another notable patent is a resistive-switching memory element, which features a unique structure with a porous layer and point defects that allow the memory element to switch between high and low resistive states, showcasing his expertise in nonvolatile memory technology.

Career Highlights: Chi-l Lang is currently employed at Intermolecular, Inc., where he continues to push the boundaries of innovation in his field. His efforts contribute not only to the company’s advancements but also to the broader technological landscape.

Collaborations: Throughout his career, Chi-l has worked alongside talented individuals, including colleagues Tony P. Chiang and Sandip Niyogi. These collaborations have undoubtedly enriched his work, leading to the successful development of inventive solutions in materials science.

Conclusion: Chi-l Lang exemplifies the spirit of innovation through his patents and collaborative efforts. His work in developing cutting-edge technologies like graphene barrier layers and resistive-switching memory elements illustrates the vital role inventors play in shaping the future of technology. As advancements continue, Chi-l's contributions will likely remain influential in the field.