Chi-Hsin Chang

Title: Chi-Hsin Chang: Innovator in Integrated Circuit Technology

Introduction

Chi-Hsin Chang is a prominent inventor based in Taipei County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work primarily focuses on integrated circuit structures and fabrication methods.

Latest Patents

Chi-Hsin Chang's latest patents include innovative methods for integrated circuit fabrication. One notable patent describes an IC fabrication method that involves forming a first fin on a semiconductor substrate, applying an isolation dielectric material over the fin, and planarizing the dielectric material. The process ensures that the top surface of the fin is covered by the dielectric material after planarization. Additionally, the method includes etching back the isolation dielectric material until the first fin protrudes from it. Another patent outlines a similar method for forming a semiconductor structure, emphasizing the importance of the fin and dielectric material in the fabrication process.

Career Highlights

Chi-Hsin Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in integrated circuit technology has positioned him as a valuable asset to the company, contributing to advancements in semiconductor manufacturing.

Collaborations

Chi-Hsin Chang has collaborated with notable colleagues, including Yi-Shien Mor and Huai-Hsien Chiu. Their combined efforts in research and development have furthered the innovation in semiconductor technologies.

Conclusion

Chi-Hsin Chang's contributions to integrated circuit technology and his innovative patents highlight his role as a key inventor in the semiconductor field. His work continues to influence advancements in technology and manufacturing processes.