This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Versum Materials US, LLC. Active years: 2021.
Company Filing History:
Years Active: 2021
Title: Innovations by Chi-Hsien Kuo
Introduction
Chi-Hsien Kuo is a notable inventor based in Chupei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of stripping solutions for integrated circuits.
Latest Patents
Chi-Hsien Kuo holds a patent for "Stripper solutions and methods of using stripper solutions." This innovation provides stripping solutions that may replace an etching resist ashing process. The solutions are designed for fabricating circuits and forming electrodes in semiconductor devices. They exhibit good photoresist removal efficiency while maintaining low silicon oxide and metal etch rates. The preferred stripping agents include polar aprotic solvents, water, hydroxylamine, corrosion inhibitors, quaternary ammonium hydroxide, and optional surfactants. Additionally, the patent outlines methods for using these solutions and describes integrated circuit devices and electronic interconnect structures prepared according to these methods. He has 1 patent to his name.
Career Highlights
Chi-Hsien Kuo is associated with Versum Materials US, LLC, where he continues to innovate in the semiconductor field. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
He has collaborated with notable colleagues such as Jhih Kuei Ge and Yi-Chia Lee, contributing to advancements in semiconductor technologies.
Conclusion
Chi-Hsien Kuo's work in developing advanced stripping solutions has made a significant impact on semiconductor manufacturing. His innovations continue to influence the industry and improve the efficiency of electronic devices.