Chi-How Wu

Title: Chi-How Wu: Innovator in Semiconductor Technology

Introduction

Chi-How Wu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on improving processes in the manufacture of integrated circuit devices.

Latest Patents

One of his latest patents is titled "In-situ strip process for polysilicon etching in deep sub-micron technology." This innovative method enhances the patterning of the polysilicon layer in integrated circuit manufacturing. The process involves several steps, including the use of a hard mask layer and a resist layer to achieve precise etching in a plasma dry etching chamber. Another notable patent is the "Method for reducing a low volatility byproduct from a wafer surface following an etching process." This method addresses the issue of volatile residual contamination on semiconductor wafers after plasma etching, ensuring cleaner and more efficient processing.

Career Highlights

Chi-How Wu is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His expertise in semiconductor processes has positioned him as a valuable asset in the industry. His innovative approaches have contributed to advancements in manufacturing techniques, particularly in the area of polysilicon etching.

Collaborations

He has collaborated with notable colleagues, including Horng-Wen Chen and Yei-Ren Chen. Their combined efforts have led to significant advancements in semiconductor technology.

Conclusion

Chi-How Wu's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as an influential inventor in the field. His work continues to impact the manufacturing processes of integrated circuit devices.