Chi-Hao Chang

Title: Chi-Hao Chang: Innovator in Semiconductor Technology

Introduction

Chi-Hao Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advanced methods for forming gate structures in transistor devices, which are crucial for the performance of modern electronic devices.

Latest Patents

Chi-Hao Chang's latest patents include innovative methods for creating gate structures in semiconductor devices. One of his patents, titled "Gate structures in transistor devices and methods of forming same," describes a method that involves forming source/drain regions in a semiconductor fin, depositing a dielectric layer, and creating a gate stack within an opening. Another notable patent, "Semiconductor device and method of forming the same," outlines a process for forming a semiconductor device that includes a dummy gate structure and the subsequent replacement with a functional gate structure.

Career Highlights

Throughout his career, Chi-Hao Chang has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and D-Link Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor fabrication.

Collaborations

Chi-Hao Chang has collaborated with notable professionals in his field, including Yu-Lien Huang and Tze-Liang Lee. These collaborations have contributed to the advancement of semiconductor technologies and the successful development of his patented methods.

Conclusion

Chi-Hao Chang is a key figure in semiconductor innovation, with a focus on improving transistor device structures. His contributions through patents and collaborations continue to influence the industry and drive technological advancements.